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Silicon nano-well arrays for reliable pattern transfer and locally confined high temperature reactions.

TitleSilicon nano-well arrays for reliable pattern transfer and locally confined high temperature reactions.
Publication TypeJournal Article
Year of Publication2011
AuthorsWi J-S, Wilson RJ, Lee D, White RM, Wang SX
JournalNanotechnology
Volume22
Issue30
Pagination305304
Date Published2011 Jul 29
ISSN1361-6528
KeywordsHot Temperature, Microscopy, Electron, Scanning, Nanostructures, Nanotechnology, Polymethyl Methacrylate, Silicon
Abstract

Si nano-well arrays, with precisely controlled undercut Si sidewall profiles and flat bottomed pockets, enable uniform nanoscale pattern transfer from resists to metal deposits without degradation of the initial lithographic resolution, as verified by the formation of arrays of Au nano-dots with 10 nm diameter. An additional functionality of the Si nano-wells as local nano-reactors, where the patterned material is enclosed in a Si pocket during high temperature reaction, is demonstrated by thermally inducing a phase transformation of the as-deposited A1 phase of FePt nano-dots to the high coercivity, chemically ordered L1(0) phase.

DOI10.1088/0957-4484/22/30/305304
Alternate JournalNanotechnology
PubMed ID21709347
PubMed Central IDPMC3167870
Grant List1U54CA119367 / CA / NCI NIH HHS / United States
U54 CA119367 / CA / NCI NIH HHS / United States
U54 CA119367-04 / CA / NCI NIH HHS / United States