Skip to content Skip to navigation

Wafer-scale synthesis of monodisperse synthetic magnetic multilayer nanorods.

TitleWafer-scale synthesis of monodisperse synthetic magnetic multilayer nanorods.
Publication TypeJournal Article
Year of Publication2014
AuthorsZhang M, Bechstein DJB, Wilson RJ, Wang SX
JournalNano Lett
Volume14
Issue1
Pagination333-8
Date Published2014 Jan 8
ISSN1530-6992
Abstract

A double exposure technique has been used to fabricate nanoimprint stamps for making monodisperse nanorods with controllable lengths. The nanorod length is defined by a normal photolithography projection process whereas the nanorod width is defined by an edge-lithography process using a soft polydimethylsiloxane (PDMS) contact mask. Taking advantage of edge-lithography, the nanorod width can be less than the diffraction limit of the exposure light. Using these nanorod stamps, synthetic magnetic multilayer (SMM) nanorods have been fabricated using nanoimprint lithography, resulting in a length variation of ∼3%. Nanorod magnetic properties have been characterized in both longitudinal and in-plane transverse directions of the nanorods. A theoretical model has been established to explain the magnetic responses and has revealed that both shape anisotropy and interlayer interactions are important in determining the properties of SMM nanorods.

DOI10.1021/nl404089t
Alternate JournalNano Lett.
PubMed ID24329003
PubMed Central IDPMC3931460
Grant ListR33 CA138330 / CA / NCI NIH HHS / United States
R33CA138330 / CA / NCI NIH HHS / United States
U54 CA119367 / CA / NCI NIH HHS / United States
U54 CA151459 / CA / NCI NIH HHS / United States
U54CA151459 / CA / NCI NIH HHS / United States